quadratic model


  • Etch Rate Experiment (Myers & Montgomery, 2002)

    Etch Rate Experiment (Myers & Montgomery, 2002)

    This case study explores the Myers and Montgomery (2002) etch rate experiment using response surface methodology (RSM) to optimise plasma etching in semiconductor manufacturing. A central composite design is used to model the effect of RF power and chamber pressure on etch rate.


  • Box-Behnken Designs explained

    Box-Behnken Designs explained

    Discover how Box-Behnken designs streamline experimental planning by minimising runs while capturing key interactions and quadratic effects. Ideal for optimising complex systems like PEM fuel cells, this method is essential for efficient and safe response surface modelling in engineering and scientific research.